RILASTIL SUN SYSTEM ACNESTIL PHOTOPROTECTIVE SPF 50+ CREAM - 40 ML
Rilastil Sun System Acnestil Photoprotective Cream SPF 50+ is a light emulsion with sebum-normalizing and mattyfing action. It provides very high protection form UVB-UVA radiation and maximum comfort on the skin. It is suitable for acne prone to skin, sensitive to the sun.
| Instructions for use |
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| Warning |
DO NOT expose babies and children to direct sunlight.
Precautions:
For external use.
Excessive exposure to sunlight is a serious risk for your health.
If product gets in contact with eyes, rinse them thoroughly with water.
The presence of filters may stain clothing.
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| Other information |
Clinically and ophthalmologically tested.
Nickel, Cobalt, Chrome, Palladium and Mercury tested.
Water resistant.
Non-comedogenic.
Hypoallergenic.
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| Ingredients |
Water, Methylene bis-benzotriazolyl Tetramethylbutylphenol (nano), Ethylhexyl Salicylate, Butyl Methoxydibenzoylmethane, Silica, Isodecyl Neopentanoate, Dicaprylyl Carbonate, Dibutyl Adipate, Bis-Ethylhexyloxyphenol Methoxyphenyl Triazine, Ethylhexyl Triazone, Ceteth-2, Ceteareth-25, Potassium Cetyl Phosphate, Polyester-7, Decyl Glucoside, Niaminacide, Tris-Biphenyl Triazine (nano), Methylpropanediol, Potassium Azeloyl Diglycinate, Neopentyl Glycol Diheptanoate, Glyceryl Dibehenate, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Tribehenin, Xanthan Gum, Tocopheryl Acetate, Dipotassium Glycyrrhizate, Glyceryl Behenate, Tetrasodium Glutamate Diacetat, Diethylhexyl Syringylidenemalonate, Propylene Glycol, Caprylic/Capric Triglyceride, Butylene Glycol, Disodium Phosphate, Schisandra Chinensis fruit extract, Diglycerin, Glycerin, Pinus Pinaster bark/bud extract, Tocopherol, Peucedanum Ostruthium leaf extract, Buddleja Davidii leaf extract, Artemisa Umbelliformis extract, Sodium Hydroxide, Ethylhexylglicerin, Caprylyl Glycol, Phenylpropanol, Propanediol, Sodium Benzoate, Potassium Sorbate, Parfum (Fragrance).
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